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Brooks Set to Unveil “Smarter” Mass Flow Controller at SEMICON China
21-03-2013, 07:35
Post: #1
Brooks Set to Unveil “Smarter” Mass Flow Controller at SEMICON China
[Image: semicon-china-logo2013.jpg]

HATFIELD, Pa. (February 27, 2013) – Brooks Instrument, a world-leading provider of flow measurement and control instrumentation to the microelectronics industry, will launch the GF135 pressure transient insensitive (PTI) mass flow controller at SEMICON China, March 19-21 at Shanghai New International Expo Center. In its first year at SEMICON China, Brooks will showcase the GF135 and its high-performance digital solutions for flow, vacuum and pressure measurement with partner SCH Electronics at booth 5505.

The GF135 improves yield and uptime with real-time integral rate-of-decay flow measurement and advanced diagnostic capabilities to verify accuracy, check valve leak-by and monitor sensor drift without stopping production. It provides market-leading actual process gas accuracy and ultra-fast flow settling time for reduced process cycle time. Onboard diagnostic data logging, zero stability trending and correction, and early detection of valve corrosion or clogging allow semiconductor manufacturers to achieve tighter tolerances and maintain uniformity in etch profiles and critical dimensions. The combination of these features allows the GF135 to deliver exceptional accuracy and cost savings to the semiconductor industry.

Additionally, Brooks will demo its GF81 mass flow controller, the new high-flow version of the GF80. The GF81 is the mass flow controller of choice for process engineers in solar, coatings and industrial thin-film applications. The GF81 offers flow rates up to 300 slpm, as well as a high-purity flow path. Unlike other high-flow mass flow controllers, it has a smaller footprint and offers the broadest range of communication protocols. The GF81 also provides market-leading process gas accuracy, delivering higher accuracy than competitive high-flow, non multi-gas/multi-range devices.
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